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47篇 您的检索式：作者名="Ellmer R"

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	题名	作者	年代	出处	被引量
1	Thermal power of substrate during ZnO : Al thin film deposition in a planar magnetron sputtering system显示文摘	Wendt R Ellmer K	1997	Appl Phys1997，82，5：	1
2	Influence of discharge parameters on the layer properties of reactive magnetron sputtered ZnO:Al films显示文摘	Ellmer K Kudella F Mientus R	1994	Thin Solid Films1994，247，：	1
3	Desorption of Zn from a growing ZnO:Al-film deposited by magnetron sputtering显示文摘	Wendt R Ellmer K	1997	Surface and Coating Technology1997，93，：	1
4	Al-doped Zinc Oxide Films Deposited by Simultaneous rfand dcExcitation of a Magnetron Plasma:Relationships between Plasma Parameters and Structural and Electrical Film Properties显示文摘	Cebulla R Wendt R Ellmer K	1998	Journal of Applied Physics1998，83，：	1
5	DC and RF magnetron sputtering of ZnO:Al films from metallic and ceramic targets: A comparative study 显示文摘	Wendt R Ellmer K	1997	Surf Coat Technol1997，93，：	1
6	Growth mecha-nism and electronic properties of doped pyrite(FeS2) crystals显示文摘	Schieck R Ellmer K	1995	Journal of Crystal Growth1995，146，14：	1
7	Influence of discharge parameters on the layer properties of reactive magnetron sputtered ZnO:Al films显示文摘	Ellmer K Kudella F Mientus R	1994	Thin Solid Films1994，247，：	1
8	显示文摘	Ellmer K Kudella F Mientus R	1994	Thin Solid Films1994，247，：	1
9	Desorption of Zn from a growing ZnO:Al-film deposited by magnetron sputtering显示文摘	Wendt R Ellmer K	1997	Surface and Coating Technology1997，93，：	1
10	Carrier transport in polycrystalline transparent conductive oxides:A comparative study of zincoxide and indium oxide显示文摘	ELLMER K MIENTUS R	2008	Thin Solid Films2008，516，：	1
11	Altitudinal variation of secondary metabolite profiles in flowering heads of Arnica montana cv显示文摘	SPITALER R SCHORHAUFER P D ELLMERER E P	2006	Phytochemistry2006，67，：	1
12	Reactive magnetron sputtering of tindoped indium oxide(ITO):influence of argon pressure and plasma excitation 显示文摘	Mientus R Ellmer K	2001	Surf Coat Techn2001，142，144：	1
13	Al-doped zinc oxide films deposited by simultaneous rf and dc excitation of a magnetron plasma:Relationships between plasma parameters and structural and electrical film properties显示文摘	Cebulla R Wendt R Ellmer K	1998	J Appl Phys1998，83，2：	1
14	A1-Doped Zinc Oxide Films Deposited by Simultaneous rf and dc Excitation of aMagnetron Plasma:Relationships Between Plasma Parameters and Structural and Electrical Film Properties显示文摘	Cebulla R Wendt R Ellmer K	1998	Journal of Applied Physics1998，83，2：	1
15	Al-doped zinc oxide films deposited by simultaneous rf and dc excitation of a magnetron plasma:Relationships between plasma parameters and structural and electrical film properties显示文摘	CEBULLA R WENDT R ELLMER K	1998	J Appl Phys1998，83，2：	1
16	DC and RF magnetron sputtering of ZnO:Al films from metallic and ceramic targets:a compara-tive study显示文摘	Ellmer K Wendt R	1997	Surface Coat Technology1997，93，：	1
17	Characterization of a magnetron sputtering discharge with simultaneous RF-and DC-excitation of the plasma for the deposition of transpa-rent and conductive ZnO:Al films显示文摘	Ellmer K Cebulla R Wendt R	1998	Surface Coat Technology1998，98，：	1
18	Dc and rf (reactive) magnetron sputtering of ZnO:Al films from metallic and ceramic targets:a comparative study显示文摘	Ellmer K Wendt R	1997	Surf Coat Tech1997，93，1：	1
19	Reactive DC magnetron sputtering of elemental targets in Ar/N2 mixtures: relation between the discharge characteristics and the heat of formation of the corresponding nitrides显示文摘	MIENTUS R ELLMER K	1999	Surface and Coatings Technology1999，，：	1
20	显示文摘	Ellmer K Kudella F Mientus R	1994	ThinSolid Films1994，247，：	1

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