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32篇 您的检索式:期刊名="Diam Rel Mater"
    题名 作者 年代 出处 被引量
1Precision micromachining of CVD diamond films 显示文摘PARK J K AYRES V M ASMUSSEN J 2000Diam Rel Mater2000,9,:1
2Cycle of two-step etching process using ICP for diamond MEMS applieation 显示文摘YAMADA T YOSHIKAWA H UETSUKA H 2007Diam Rel Mater2007,16,:1
3New Non-metallic Catalysts for the Synthesis of High Pressure, High Temperature Diamond 显示文摘Akaishi M 1993Diam Rel Mater1993,2,:1
4Characterization of three-dimensional microstructures in single-crystal diamond 显示文摘OLIVERO P RUBANOV S REICHART P 2006Diam Rel Mater2006,15,:1
5Preparation of diamond whiskers using Ar/O2 plasma etching 显示文摘I C Y HATrA A 2005Diam Rel Mater2005,14,:1
6Fabrication of diamond nanoeones and nanowhiskers by bias-assisted plasma etching 显示文摘ZOU Y S MA K L ZHANG W J 2007Diam Rel Mater2007,16,:1
7Cycle of two-step etching process using ICP for diamond MEMS applications 显示文摘YAMADA T YOSHIKAWA H UETSUKA H 2007Diam Rel Mater2007,16,:1
8Thinning and patterning of CVD diamond films by diffusional reaction 显示文摘JIN S GRAEBNER J E TIEFEL T H 1993Diam Rel Mater1993,2,:1
9Quality of diamond wafers grown by microwave plasma CVD:effects of gas flow rate显示文摘 SYCHOV I VLASOV I el al 1999Diam Rel Mater1999,8,:1
10Synthesis of nanocrystalline diamond films using microwave plasma CVD显示文摘Yoshikawa H Morel C Koga Y 2001Diam Rel Mater2001,10,:1
11Growth of diamond films by a 5-kW microwave plasma CVD reactor显示文摘 AACHIBANA T KOBASHI K 2001Diam Rel Mater2001,10,:1
12The fabrication of nanocrystalline diamond films using hot filament CVD显示文摘Wang T Xin H W Zhang Z M 2004Diam Rel Mater2004,13,:1
13Ultrananocrystalline diamond thin films for MEMS and moving mechanical assembly devices 显示文摘Krauss A R Auciello O Gruen D M 2001Diam Rel Mater2001,10,:1
14Quantitative study of epitaxial CVD diamond deposits:Correlations between nucleation parameters and experimental conditions显示文摘GUISE A BARRAT S BAUER G E 2007Diam Rel Mater2007,16,4:1
15Synthesis of diamond in high power-deusity microwave methane/hydrogen/oxygen plasmas at elevated substrate temperature显示文摘 WEI J TZENG Y 1999Diam Rel Mater1999,8,:1
16Nucleation mechanisms of diamond in plasma chemical vapor deposition显示文摘Yugo S Kimura T Kanai T 1993Diam Rel Mater1993,2,:1
17Dependence of the growth rate, quality, and morphology of diamond coatings on the pressure during the CVD-process in an industrial hot-filament plant显示文摘Schwarz S Rosiwal S M Frank M 2002Diam Rel Mater2002,11,:1
18Low roughness diamond films produced at temperatures less than 600℃显示文摘Silva F Gicquel A Chiron A 2000Diam Rel Mater2000,9,:1
19Prospective n-type impurities and methods of diamond doping显示文摘Popovici G Prelas M A 1995Diam Rel Mater1995,4,:1
20Investigation of n-doping in CVD diamond using gap states spectroscopy 显示文摘Nesladek M Meykens K Stals L M 1996Diam Rel Mater1996,5,:1
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