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| 1 | Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure显示文摘Functional nanostructures are exploited for a variety of cutting-edge fields including plasmonics,metasurfaces,and biosensors,just to name a few.Some applications require nanostructures with uniform feature sizes while others rely on spatially varying morphologies.However,fine manipulation of the feature size over a large area remains a substantial challenge because mainstream approaches to precise nanopatterning are based on low-throughput pixel-by-pixel processing,such as those utilizing focused beams of photons,electrons,or ions.In this work,we provide a solution toward wafer-scale,arbitrary modulation of feature size distribution by introducing a lithographic portfolio combining interference lithography(IL)and grayscale-patterned secondary exposure(SE).Employed after the high-throughput IL,a SE with patterned intensity distribution spatially modulates the dimensions of photoresist nanostructures.Based on this approach,we successfully fabricated 4-inch wafer-scale nanogratings with uniform linewidths of<5%variation,using grayscale-patterned SE to compensate for the linewidth difference caused by the Gaussian distribution of the laser beams in the IL.Besides,we also demonstrated a wafer-scale structural color painting by spatially modulating the filling ratio to achieve gradient grayscale color using SE. | Zhuofei Gan Hongtao Feng Liyang Chen Siyi Min Chuwei Liang Menghong Xu Zijie Jiang Zhao Sun Chuying Sun Dehu Cui Wen-Di Li | 2022 | Light(Science & Applications)2022，11，5： | 3 |
| 2 | Harvest of near infrared light in PbSe nanocrystal-polymer hybrid photovoltaic cells显示文摘 | Cui Dehu Xu Jian Zhu Ting | 2006 | Applied Physics Letters2006，88，18： | 1 |
| 3 | High-fidelity and clean nanotransfer lithography using structure-embedded and electrostatic-adhesive carriers显示文摘Metallic nanostructures are becoming increasingly important for both fundamental research and practical devices.Many emerging applications employing metallic nanostructures often involve unconventional substrates that are flexible or nonplanar,making direct lithographic fabrication very difficult.An alternative approach is to transfer prefabricated structures from a conventional substrate;however,it is still challenging to maintain high fidelity and a high yield in the transfer process.In this paper,we propose a high-fidelity,clean nanotransfer lithography method that addresses the above challenges by employing a polyvinyl acetate(PVA)film as the transferring carrier and promoting electrostatic adhesion through triboelectric charging.The PVA film embeds the transferred metallic nanostructures and maintains their spacing with a remarkably low variation of<1%.When separating the PVA film from the donor substrate,electrostatic charges are generated due to triboelectric charging and facilitate adhesion to the receiver substrate,resulting in a high large-area transfer yield of up to 99.93%.We successfully transferred the metallic structures of a variety of materials(Au,Cu,Pd,etc.)with different geometries with a<50-nm spacing,high aspect ratio(>2),and complex 3D structures.Moreover,the thin and flexible carrier film enables transfer on highly curved surfaces,such as a single-mode optical fiber with a curvature radius of 62.5μm.With this strategy,we demonstrate the transfer of metallic nanostructures for a compact spectrometer with Cu nanogratings transferred on a convex lens and for surface-enhanced Raman spectroscopy(SERS)characterization on graphene with reliable responsiveness. | Zhuofei Gan Jingxuan Cai Zhao Sun Liyang Chen Chuying Sun Junyi Yu Zeyu Liang Siyi Min Fei Han Yu Liu Xing Cheng Shuhui Yu Dehu Cui Wen-Di Li | 2023 | Microsystems & Nanoengineering2023，9，1： | 1 |
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