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| 1 | 工作参数对平面磁控溅射系统沉积速率的影响显示文摘为了分析磁场、阴极电压、气压和靶基板间距等工作参数对沉积速率的影响,本文对磁控放电过程和沉积过程进行了讨论,并着重对沉积速率计算的无碰撞模型和碰撞模型进行了研究。靶功率是影响沉积速率的关键因素,通过对磁控放电特性分析发现,随着磁场、电压的增大,等离子体阻抗降低,放电电流和靶功率增大,随着气压的增大,放电电流和靶功率先增大后减小;采用碰撞模型对沉积速率进行模拟发现,在靶功率恒定的情况下,沉积速率随着气压和靶基板间距的增大而减小。因此,在气压和靶基板间距保持恒定的情况下,沉积速率会随着磁场和电压的增大而增大;而在磁场、电压和靶基板间距保持恒定的情况下,沉积速率随着气压的增大,先增大后减小。上述结论对于薄膜制备效率和质量的提高具有一定的理论指导意义。 | 邱清泉 励庆孚 苏静静 Jiao Yu Finley Jim | 2009 | 真空科学与技术学报2009，29，1： | 13 |
| 2 | 工作参数对平面直流磁控溅射放电特性的影响显示文摘基于OOPIC软件,对平面直流磁控溅射放电等离子体进行了二维自洽粒子模拟,重点研究了磁场、阴极电势和气压等工作参数对磁控放电特性的影响。模拟发现,在一定的工作参数范围内,随着磁场的增强,鞘层厚度变窄,鞘层电势降减小,阴极离子密度增大,但是分布变窄;随着阴极电势的增加,鞘层厚度稍微变窄,鞘层电势降增大,阴极离子密度增大,分布变宽;随着气压的升高,鞘层厚度基本不变,鞘层电势降会增大,阴极离子密度先增大后减小,分布略微变宽。 | 邱清泉 励庆孚 苏静静 JLAO Yu Finley Jim | 2009 | 核聚变与等离子体物理2009，，2： | 2 |
| 3 | Simulation to Predict Target Erosion of Planar DC Magnetron显示文摘Plasma properties in a planar DC magnetron system are simulated by a non-self-consistent particle method in two dimensions.Through tracing the trajectories of the energeticelectrons in the specified electric field and the magnetic field,and treating the collision processby Monte Carlo method,the spatial profile of ionization events can be obtained conveniently.Assuming that the ions speed up from the ionization points and bombard the target with theenergy at these points,and according to the Yamamura/Tawara method,the target erosion canbe predicted.The magnetic field is calculated by the finite element method,and the electric fieldis estimated according to the self-consistent simulation and measured results.The influence ofthe time step size on the target erosion profile is analysed first to find a proper step size.Thenthe influence of electric field estimated on the erosion profile is discussed.The erosion profile maybecome narrower if the sheath thickness is increased.Finally,considering the dynamic erosionprocess,the erosion profile may get wider over time for the magnetron with shunt bar. | 邱清泉 励庆孚 苏静静 焦余 FINLEY Jim | 2008 | Plasma Science and Technology2008，10，5： | 1 |
| 4 | Magnetic Field Improvement in End Region of Rectangular Planar DC Magnetron Based on Particle Simulation显示文摘For a rectangular planar direct current(DC)magnetron,anomalous target erosion may occur in the curve-out region and inner side of the curved region.One key factor is that the magnetic field in the end region is weaker than that in the straight region,and another important factor may be that there is a circumferential component of the magnetic field in the curved region.Through a calculation of three-dimensional magnetic field for the rectangular magnetron, a magnet structure shimmed by permanent magnet bars and ferromagnetic bars is proposed to solve the above problems.Through a three-dimensional non-self-consistent particle simulation and the Yamamura/Tawara formula,the target erosion profile could be predicted.The simulation results show that for an improved uniformity in magnetic field,the entire target utilization could be much enhanced. | 邱清泉 励庆孚 苏静静 焦余 Jim FINLEY | 2008 | Plasma Science and Technology2008，10，6： | 0 |
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