| 1 | Characterization of ZnO:Al Films Deposited on Organic Substrate by r.f. Magnetron Sputtering显示文摘Transparent conducting Al-doped zinc oxide (ZnO:Al) films with good adhesion have been deposited on polyimide thin film substrates by r.f. magnetron sputtering technique at low substrate temperature (25~180℃). The structural,optical and electrical properties of the deposited films were investigated. High quality films with electrical resistivity as low as 8.5× 10-4 Ω.cm and the average transmittance over 74% in the wavelength range of the visible spectrum have been obtained. The electron carrier concentrations are in the range from 2.9×1020 to 7.1×1020 cm-3 with mobilities from 4 to 8.8 cm2 V-1s-1. The densities of the films are in the range from 4.58 to 5.16 g/cm-3. | ShiyongZHANG HongleiMA JinMA XiaotaoHAO | 2003 | Journal of Materials Science & Technology2003，19，4： | 0 |
您所在的机构暂未开通此部分的功能，请联系管理员