| 1 | 金属硬掩膜打开工艺中的CD偏差负载控制显示文摘本文系统地研究了密集线条和孤立线条间CD(关键尺寸)刻蚀偏差参数对金属硬掩膜(MHM)刻蚀工艺的影响,涉及的范围有化学气体、源功率、压力、偏差功率以及ESC温度。特别是,如果正确地应用基于CH4的等离子固化光刻胶掩膜,发现它具有控制密集和ISO CD负载的特殊能力,且同时保持准确的密集CD。而且,在基于Cl2和基于HBr的BARC打开步骤之间,还看到刻蚀化学气体对CD负载的有重大影响。此外,也发现M-HM的应力和刻蚀后剖面影响CD负载性能。根据这些发现,成功地展示了改善钨触点和铜沟槽之间电气互连的解决方法。 | D.J.Wang M.D.Hu J.Q.Zhou C.L.Zhang H.Y.Zhang X.P.Wang | 2013 | 功能材料与器件学报2013，19，6： | 0 |
| 2 | FABRICATION AND PROPERTIES OF CERAMIC -CEMENTED CARBIDE COMPACT INSERTS显示文摘A novel ceramic cemented carbide compact insert was developed using hot pressing sintering technique. The surface layers of the sandwich material were ceramic and the middle layer was cemented carbide. The factors that affect the properties of the compact insert were analyzed. Theoretical analyses and experiments indicated that the cemented carbide with greater elastic module and thermal expansion coefficient than ceramic should be used in the sandwich material in order to get high equivalent flexure strength and the geometric parameters of the compact insert are also important to its properties. | J.Q.Zhou,X.Ai,Z.Q.Li and C.Z.Huang Institute of Mechanical Engineering, Shandong University of Technology, Jinan 250061, China | 1999 | Acta Metallurgica Sinica(English Letters)1999，12，5： | 0 |
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