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24篇 您的检索式：作者名="Rangelow"

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	题名	作者	年代	出处	被引量
1	Scanning probe lithography on calixarene towards single-digit nanometer fabrication显示文摘Cost effective patterning based on scanning probe nanolithography(SPL)has the potential for electronic and optical nano-device manufacturing and other nanotechnological applications.One of the fundamental advantages of SPL is its capability for patterning and imaging employing the same probe.This is achieved with self-sensing and self-actuating cantilevers,also known as‘active'cantilevers.Here we used active cantilevers to demonstrate a novel path towards single digit nanoscale patterning by employing a low energy(<100 eV)electron exposure to thin films of molecular resist.By tuning the electron energies to the lithographically relevant chemical resist transformations,the interaction volumes can be highly localized.This method allows for greater control over spatially confined lithography and enhances sensitivity.We found that at low electron energies,the exposure in ambient conditions required approximately 10 electrons per single calixarene molecule to induce a crosslinking event.The sensitivity was 80-times greater than a classical electron beam exposure at 30 keV.By operating the electro-exposure process in ambient conditions a novel lithographic reaction scheme based on a direct ablation of resist material(positive tone)is presented.	Marcus Kaestner Ivo W Rangelow	2020	International Journal of Extreme Manufacturing2020，2，3：	2
2	Dry etching -based silicon micro -ma -chining for MEMS显示文摘	Ivo W Rangelow		0，，：	1
3	Investigation of radical-surface reactions 显示文摘	RANGELOW I W	2001	J Vac Sci Technol B2001，19，6：	1
4	'NANOJET':Tool for the nanofabrication 显示文摘	VOIGT J	2001	J Vac Sci Technol B2001，19，6：	1
5	Electrostatically driven microgripper 显示文摘	Volland B E Heerlein H Rangelow I W	2002	Microelectronic Engineering2002，6162，：	1
6	Dry etching-based silicon micro-machining for MEMS显示文摘	Rangelow I W	2001	Vacuum2001，62，3：	1
7	Dry etching-based silicon micro-machining for MEMS 显示文摘	RANGELOW I W	2001	Vacuum2001，62，23：	1
8	Dry etchingbased silicon micromachining for MEMS显示文摘	RANGELOW I W	2001	Vacuum2001，62，：	1
9	High aspect ratio silicon tips field emitter array显示文摘	I.W. Rangelow St. Biehl	2001	Microelectronic Engineering2001，，：	1
10	显示文摘	Rangelow I W	2001	Vacuum2001，62，：	1
11	Electrostatically driven microgripper 显示文摘	VOLLAND B E HEERLEIN H RANGELOW I W	2002	Microelectronic Engineering2002，6162，：	1
12	Dry Etching-Based Silicon Micro-Machining for MEMS显示文摘	Ivo W Rangelow	2001	Vacuum2001，62，：	1
13	Dry Etching-based Silicon Micro-ma-chining for MEMS显示文摘		2001	Vacuum2001，62，：	1
14	Fabrication of High Aspect Ratio Structures Using Chlorine Gas Chopping Technique显示文摘	Rangelow I W	1997	Mi-croelectronie Engineering1997，35，：	1
15	Electrostatically driven microgripper显示文摘	Volland B E Heerlein H Rangelow I W	2002	Microelectronic Engineering2002，6162，：	1
16	Electro- statically driven microgripper 显示文摘	Volland B E Heerlein H Rangelow I W	2002	Microelectronic Engineering2002，6162，：	1
17	Fabrication of high aspect ratio structures using chlorine gas chopping technique显示文摘	PAUL A K RANGELOW I W	1997	Microelectronic Engineering1997，35，1234：	1
18	Reactive ion etching for high aspect ratio silicon micro machining显示文摘	RANGELOW I W	1997	Surface and Coatings Technology1997，97，：	1
19	Electrostatically driven microgripper显示文摘	VOLLAND B E HEERLEIN H RANGELOW I W	2002	Microelectronic Engineering2002，6162，：	1
20	On the solution of the problem of seismic waves propagation in a multilayered nonelastic region by the BEM显示文摘	Dineva P Hadjikov L Rangelow T	1991	Soil Dynamics and Earthquake Engineering1991，10，6：	1

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