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10篇 您的检索式:作者名="Shakkthivel"
    题名 作者 年代 出处 被引量
1在以EDTA和柠檬酸为配位剂的酸性硫代硫酸盐–亚硫酸盐镀液中电沉积金(英文)显示文摘以乙二胺四乙酸或柠檬酸作配位剂,在无氰的硫代硫酸盐–亚硫酸盐体系中研究了金在镀镍铜基底上的电沉积。在温度为60°C,pH为6和电流密度为2A/dm2的条件下,研究了不同配位剂对电流效率、镀速、镀层硬度及镀液分散能力的影响。最佳的镀液组成为0.5mol/L硫代硫酸钠–亚硫酸钠+0.2mol/L乙二胺四乙酸(或0.3mol/L柠檬酸)。该镀液具有良好的分散能力及高达98%的电流效率。采用扫描电镜、原子力显微镜及X射线衍射分析了镀态金镀层的表面形貌和晶体结构。所得的金镀层几乎无孔(孔隙率〈2-4个/cm2),结合力良好,硬度适中(80-130HV)。AMUTHA K SHAKKTHIVEL P VASUDEVAN T 2007电镀与涂饰2007,26,8:6
2Acrylic Acid-Diphenylamine Sul- phonic Acid Copolymer Threshold Inhibitor for Sulphate and Carbonate Scales in Cooling Water Systems 显示文摘Shakkthivel P Vasudevan T 2006Desalination2006,197,13:1
3Acrylic acid-diphenylamine sulphonic acid copolymer threshold inhibitor for sulphate and carbonate scales in cooling water systems 显示文摘P Shakkthivel T Vasudevan 2006Desalination2006,197,2:1
4Acrylic acid-diphenylamine salphonic acid cnpolymer threshold inhibitor for sulphate and carbonate scales in cooling water systems显示文摘Shakkthivel P Vasudevan T 2006Desalination2006,197,123:1
5Acrylic acid-diphenylamine sulphonic acid copolymer threshold inhibitor for sulphate and carbonate scales in cooling water systems 显示文摘Shakkthivel P Vasudevan T 2006Desalination2006,197,123:1
6Role of organic additives on zinc plating显示文摘B. Kavitha P. Santhosh M. Renukadevi A. Kalpana P. Shakkthivel T. Vasudevan 2006Surface & Coatings Technology2006,,6:1
7Simultaneous determination of as-corbic acid and dopamine in the presence of uric acid on ru-thenium oxide modified electrode显示文摘Shakkthivel P Chen SM 2007Biosens Bioelectron2007,22,8:1
8显示文摘SHAKKTHIVEL P CHEN Shenming 2007Biosens Bioelectron2007,22,8:1
9Influence of Mg doping on the performance ofLiNiO2 matrix ceramic nanoparticles in high-voltage lithium-ion cells 显示文摘SATHIYAMOORTHI R SHAKKTHIVEL P RAMALAKSHMI S SHUL Y G 2007Journal of Power Sources2007,171,:1
10Acrylic acid-diphenylamine sulphonic acid copolymer threshold inhibitor for sulphate and carbonate scales in cooling water systems 显示文摘Shakkthivel P Vasudevan T 2006Desali-nation2006,197,13:1
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