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60篇 您的检索式：作者名="Steigerwald R"

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	题名	作者	年代	出处	被引量
1	Mechanisms of copper removal during chemical mechanical polishing 显示文摘	Steigerwald J M Murarka S P Gutmann R J	1995	Journal of Vacuum Science and Technology B1995，13，6：	1
2	Chemical process in the chemical mechanical polishing of copper 显示文摘	Steigerwald J M Murarka S P Gutmann R J	1995	Materials Chemistry and Physics1995，41，3：	1
3	Investigation on CdSe films prepared by chemical deposition by X-ray diffraction显示文摘	BAWENDI M G KORTAN A R STEIGERWALD M L	1989	J Chem Phy1989，91，11：	1
4	A comparison of half-bridge resonant converter topologies显示文摘	Steigerwald R L	1988	IEEE Transactions on Power Electronics1988，3，2：	1
5	Nanoscale Atoms in Solid- State Chemistry 显示文摘	Roy X Lee C H Crowther A C Schenck C L Besara T Lalancette R A Siegrist T Stephens P W Brus L E Kim P Steigerwald M L Nuckolls C	2013	Science2013，，341：	1
6	High-power AlGaInN flip-chip light-emitting diodes 显示文摘	Wierer J J Steigerwald D A Krames M R	2001	Appl Phys Lett2001，78，22：	1
7	A comparison of half-bridge resonant converter topologies显示文摘	STEIGERWALD R L	1988	IEEE Transactions on Power Electronics1988，3，2：	1
8	Microcomputer control of a residential photovoltaic power conditioning system显示文摘	BOSE B K SZCZESNY P M STEIGERWALD R L	1985	IEEE Trans Industry Applications1985，21，：	1
9	Polymerase chain reaction-aided genomic sequencing of an X chromosome-linked CpG island: methylation patterns suggest clonal inheritance, CpG site autonomy, and an explaination of activity state stability 显示文摘	Pfeifer G P Steigerwald S D Hansen R S	1990	Proc Natl Acad Sci USA1990，87，：	1
10	Direct writing of ferroelectric domains on the x-and y-faces of lithium niobate using a continuous wave ultraviolet laser显示文摘	STEIGERWALD H YING Y J EASON R W	2011	Appl Phys Lett2011，98，6：	1
11	Subthalamic deep brain stimulation increases pallidal firing rate and regularity 显示文摘	Reese R Leblois A Steigerwald F	2011	Exp Neurol2011，229，2：	1
12	Chemical mechanical polishing of copper with oxide and polymer interlevel dielectrics 显示文摘	Gutmann R J Steigerwald J M You L	1995	Thin Solid Films1995，270，12：	1
13	Highpower AlGaInN flip-chip light-emitting diodes显示文摘	Wierer J J Steigerwald D A Krames M R	2001	Applied Physics Letters2001，78，22：	1
14	Pattern geometry effects in the chemical mechanical polishing of inlaid copper structures 显示文摘	Steigerwald J M Zirpoli R Murarka S P	1994	Journalofthe Electrochemical Society1994，141，：	1
15	Effect of copper ions in the slurry on the chemical mechanical polish rate of titanium 显示文摘	Steigerwald J M Murarka S P Gutmarm R J	1994	Journal of the Electrochemical Society1994，141，：	1
16	Requirements for adeno-associated virus-derived non-viral vectors to achieve stable and site-specific integration of plasmid DNA in liver carcinoma cells显示文摘	Steigerwald R Rabe C Schmitz V	2003	Digestion2003，68，1：	1
17	Chemical processes in the chemical mechanical polishing of copper 显示文摘	STEIGERWALD J M MURARKA S P GUTMANN R J	1995	Mater Chem Phys1995，41，5：	1
18	Analysis of a resonant transistor DC-DC converter with capacitive output filter显示文摘	STEIGERWALD R L	1985	IEEE Trans Industrial Electron1985，32，4：	1
19	显示文摘	Steigerwald J M Zirpoli R Murarka S P	1994	J Electrochem Soc1994，141，10：	1
20	A comparison of half- bridge resonant converter topologies显示文摘	STEIGERWALD R L	1988	IEEE Trans Power Electron1988，3，2：	1

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