维普期刊资源整合服务平台（V6.5）

维普中文期刊产品整合服务

2篇 您的检索式：作者名="Chenliang Ding"

选中清除导出查看参考文献查看引证文献引用追踪共1页首页上一页第1页下一页末页 /1 跳转

		题名	作者	年代	出处	被引量
	1	High efficiency generation of tunable ellipse perfect vector beams显示文摘We present a highly efficient method of generating and shaping ellipse perfect vector beams (EPVBs) with a prescribed ellipse intensity profile and continuously variant linear polarization state. The scheme is based on the coaxial superposition of two orthogonally polarized ellipse laser beams of controllable phase vortex serving as the base vector components. The phase-only computer-generated hologram is specifically designed by means of a modified iteration algorithm involving a complex amplitude constraint, which is able to generate an EPVB with high diffraction efficiency in the vector optical field generator. We experimentally demonstrate that the efficiency of generating the EPVB has a notable improvement from 1.83% in the conventional complex amplitude modulation based technique to 11.1% in our method. We also discuss and demonstrate the simultaneous shaping of multiple EPVBs with independent tunable ellipticity and polarization vortex in both transversal (2D) and axial (3D) focusing structures, proving potentials in a variety of polarization-mediated applications such as trapping and transportation of particles in more complex geometric circumstances.	LIN LI CHENLIANG CHANG CAOJIN YUAN SHAOTONG FENG SHOUPING NIE ZHI-CHENG REN HUI-TIAN WANG JIANPING DING	2018	Photonics Research2018，6，12：	5
	2	Direct laser writing breaking diffraction barrier based on two-focus parallel peripheralphotoinhibition lithography显示文摘Direct laser writing(DLW)enables arbitrary three-dimensional nanofabrication.However,the diffraction limit poses a major obstacle for realizing nanometer-scale features.Furthermore,it is challenging to improve the fabrication efficiency using the currently prevalent single-focal-spot systems,which cannot perform high-throughput lithography.To overcome these challenges,a parallel peripheral-photoinhibition lithography system with a sub-40-nm two-dimensional feature size and a sub-20-nm suspended line width was developed in our study,based on two-photon polymerization DLW.The lithography efficiency of the developed system is twice that of conventional systems for both uniform and complex structures.The proposed system facilitates the realization of portable DLW with a higher resolution and throughput.	Dazhao Zhu Liang Xu Chenliang Ding Zhenyao Yang Yiwei Qiu Chun Cao Hongyang He Jiawei Chen Mengbo Tang Lanxin Zhan Xiaoyi Zhang Qiuyuan Sun Chengpeng Ma Zhen Wei Wenjie Liu Xiang Fu Cuifang Kuang Haifeng Li Xu Liu	2022	Advanced Photonics2022，4，6：	1

返回顶部每页显示：

共1页首页上一页第1页下一页末页 /1 跳转

goolge学术搜索-维普

网站首页 | 关于我们 | 联系我们 | 产品服务 | 客服中心 | 广告服务 | 版权声明 | 网站联盟 | 友情链接 | 售卡网点

版权所有© 渝B2-20050021-1　渝公网安备 50019002500403号　违法和不良信息举报中心

互联网出版许可证新出网证(渝)字10号全国400电话 - 免长途话费