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	题名	作者	年代	出处	被引量
1	Development of massively parallel electron beam direct write lithography using active-matrix nanocrystalline-silicon electron emitter arrays显示文摘Nanoscale lithographic technologies have been intensively studied for the development of the next generation of semiconductor manufacturing practices.While mask-less/direct-write electron beam(EB)lithography methods serve as a candidate for the upcoming 10-nm node approaches and beyond,it remains difficult to achieve an appropriate level of throughput.Several innovative features of the multiple EB system that involve the use of a thermionic source have been proposed.However,a blanking array mechanism is required for the individual control of multiple beamlets whereby each beamlet is deflected onto a blanking object or passed through an array.This paper reviews the recent developments of our application studies on the development of a high-speed massively parallel electron beam direct write(MPEBDW)lithography.The emitter array used in our study includes nanocrystalline-Si(nc-Si)ballistic electron emitters.Electrons are drifted via multiple tunnelling cascade transport and are emitted as hot electrons.The transport mechanism allows one to quickly turn electron beamlets on or off.The emitter array is a micro-electro-mechanical system(MEMS)that is hetero-integrated with a separately fabricated active-matrix-driving complementary metal-oxide semiconductor(CMOS)large-scale integration(LSI)system that controls each emitter individually.The basic function of the LSI was confirmed to receive external writing bitmap data and generate driving signals for turning beamlets on or off.Each emitted beamlet(10×10μm^(2))is converged to 10×10 nm^(2) on a target via the reduction electron optic system under development.This paper presents an overview of the system and characteristic evaluations of the nc-Si emitter array.We examine beamlets and their electron emission characteristics via a 1:1 exposure test.	Masayoshi Esashi Akira Kojima Naokatsu Ikegami Hiroshi Miyaguchi Nobuyoshi Koshida	2015	Microsystems & Nanoengineering2015，1，1：	4
2	Micro-nano electromechanical system by bulk silicon micromachining显示文摘	Masayoshi Esashi Takahito Ono	2002	光学精密工程2002，10，6：	3
3	Precise motion control of a nanopositioning PZT microstage using integrated capacitive displacement sensors 显示文摘	Xu H G Ono T Esashi M	2006	Journal of Micromechanics and Microengineering2006，16，12：	1
4	Three-axis magneto-impedance effect sensor system for detecting position and orientation of eatheter tip 显示文摘	Totsu K Haga Y Esashi M	2004	Sensors and Actuators A2004，111，23：	1
5	Wide dynamic range silicon diaphragm vacuum sens-or by electrostatic servo system显示文摘	MIYASHITA H ESASHI M	2000	Journal of Vacuum Science & Technology2000，18，6：	1
6	Microflow devices and system 显示文摘	Shoji Shuchi Esashi Masayoshi	1994	J Micromech Microeng1994，4，：	1
7	Wafer level packaging of MEMS显示文摘	ESASHI M	2008	J Micromech Microeng2008，18，7：	1
8	Acceleration Switch with Extended Holding Time Using Squeeze Film Effect for Side Airbag System显示文摘	Matsunaga T Esashi M	2002	Sensors and Actuators2002，100，1：	1
9	Acceleration switch with extended holding time using squeeze film effect for side airbag systems显示文摘	Matsunaga T Esashi M	2002	Sensors and Actuators A-Physical2002，100，1：	1
10	A novel electrostatic servo capacitive vacuum sensor显示文摘	Wang Yuelin ESASHI M	1997	International Conference on Solid-state Sensors and Actuators1997，，：	1
11	Silicon micromachining for integrated microsystems显示文摘	ESASHI M	1996	Vacuum1996，47，：	1
12	High-speed imaging by electromagnetically actuated probe with dual spring显示文摘	Lee D W Ono T Esashi M	2000	J of MEMS2000，9，4：	1
13	Wide dynamic range siheon diaphragm vacuum sensor by electrostatic servo system 显示文摘	MIYASHITA H ESASHI M	2000	Vac Sci Technol B2000，18，：	1
14	Deep reactive ion etching of Pyrex glass using SF6 plasma显示文摘	Li X H Abe T Esashi M	2001	Sensors and Actuators A2001，87，：	1
15	Energy dissipation in submicrometer thick single-crystal silicon cantilevers 显示文摘	Ono T Esashi M	2002	Journal of Microelectromechanical Systems2002，11，6：	1
16	Micropump and sample-injector for integrated chemical analysis system显示文摘	SHOJ I S NA KA GA WA S ESASHI N	1990	Sensor and Actuators A1990，2123，：	1
17	Wafer level packaging of MEMS 显示文摘	Esashi	2008	Micromech Micro- eng2008，18，07：	1
18	A bellows-shape electrostatic micro,actuator 显示文摘	MINAMI K MORISHITA H ESASHI M	1999	Sensors and Actuators1999，72，3：	1
19	Macroporous silicon-based deep anisotropic etching显示文摘	Tao Y Esashi M	2005	J Micromech Microeng2005，15，4：	1
20	Deep reactive ion etching of Pyrex glass using SF6 plasma显示文摘	Li X H Abe T Esashi M	2001	Sensors and Actuators A2001，87，：	1

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