|
|
|
题名
|
作者
|
年代
|
出处
|
被引量
|
| 1 | High-speed femtosecond laser plasmonic lithography and reduction of graphene oxide for anisotropic photoresponse显示文摘Micro/nanoprocessing of graphene surfaces has attracted significant interest for both science and applications due to its effective modulation of material properties,which,however,is usually restricted by the disadvantages of the current fabrication methods.Here,by exploiting cylindrical focusing of a femtosecond laser on graphene oxide(GO)films,we successfully produce uniform subwavelength grating structures at high speed along with a simultaneous in situ photoreduction process.Strikingly,the well-defined structures feature orientations parallel to the laser polarization and significant robustness against distinct perturbations.The proposed model and simulations reveal that the structure formation is based on the transverse electric(TE)surface plasmons triggered by the gradient reduction of the GO film from its surface to the interior,which eventually results in interference intensity fringes and spatially periodic interactions.Further experiments prove that such a regular structured surface can cause enhanced optical absorption(>20%)and an anisotropic photoresponse(~0.46 ratio)for the reduced GO film.Our work not only provides new insights into understanding the laser-GO interaction but also lays a solid foundation for practical usage of femtosecond laser plasmonic lithography,with the prospect of expansion to other two-dimensional materials for novel device applications. | Tingting Zou Bo Zhao Wei Xin Ye Wang Bin Wang Xin Zheng Hongbo Xie Zhiyu Zhang Jianjun Yang Chunlei Guo | 2020 | Light(Science & Applications)2020，9，1： | 17 |
| 2 | Nanoimprint lithography for the manufacturing of flexible electronics显示文摘Flexible electronics have received considerable attention in academies and industries for their promising applications in enormous fields, such as flexible displays, wearable sensors, artificial skins, and flexible energy devices. Challenges remain in developing a flexible and scalable manufacturing method to facilitate the fabrication of multi-functional structures in a flexible electronic system. Nanoimprint lithography is a high resolution and low-cost approach to fabricate nanostructures over a large area. This paper reviews recent progress of nanoimprint lithography and its applications in flexible electronics. The basic principles, classification, research focus, and critical issues of nanoimprint lithography are elaborated. Then, the advantages of nanoimprint lithography are demonstrated in several typical applications related to flexible electronics, including conductive films, optoelectronic devices, flexible sensors, energy harvesting and storage devices, and bioinspired electronic devices. Finally,the challenges and perspectives of nanoimprint lithography in flexible electronic systems are discussed. | SHAO JinYou CHEN XiaoLiang LI XiangMing TIAN HongMiao WANG ChunHui LU BingHeng | 2019 | Science China(Technological Sciences)2019，62，2： | 6 |
| 3 | Large area mold fabrication for the nanoimprint lithography using electron beam lithography显示文摘The mold fabrication is a critical issue for the development of nanoimprint lithography as an effective low-cost and mass production process.This paper describes the fabrication process developed to fabricate the large area nanoimprint molds on the silicon wafers.The optimization of e-beam exposure dose and pattern design is presented.The overlayer process is developed to improve the field stitching accuracy of e-beam exposure,and around 10 nm field stitching accuracy is obtained.By means of the optimization of the e-beam exposure dose,pattern design and overlayer process,large area nanoimprint molds having dense line structures with around 10 nm field stitching accuracy have been fabricated.The fabricated mold was used to imprint commercial imprinting resist. | CHU JinKui1,2,MENG FanTao1,2,HAN ZhiTao1,2 & GUO Qing1,2 1 Key Laboratory for Micro/Nano Technology and System of Liaoning Province,Dalian University of Technology,Dalian 116024,China 2 Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education,Dalian University of Technology,Dalian 116024,China | 2010 | Science China(Technological Sciences)2010，53，1： | 6 |
| 4 | Doubling the field of view in off-axis low-coherence interferometric imaging显示文摘We present a new interferometric and holographic approach,named interferometry with doubled imaging area(IDIA),with which it is possible to double the camera field of view while performing off-axis interferometric imaging,without changing the imaging parameters,such as the magnification and the resolution.This technique enables quantitative amplitude and phase imaging of wider samples without reducing the acquisition frame rate due to scanning.The method is implemented using a compact interferometric module that connects to a regular digital camera,and is useful in a wide range of applications in which neither the field of view nor the acquisition rate can be compromised.Specifically,the IDIA principle allows doubling the off-axis interferometric field of view,which might be narrower than the camera field of view due to low-coherence illumination.We demonstrate the proposed technique for scan-free quantitative optical thickness imaging of microscopic biological samples,including live neurons and a human sperm cell in rapid motion under high magnification.In addition,we used the IDIA principle to perform non-destructive profilometry during a rapid lithography process of transparent structures. | Pinhas Girshovitz Natan T Shaked | 2014 | Light(Science & Applications)2014，3，1： | 5 |
| 5 | Electro-Optically Switchable Optical True Delay Lines of Meter-Scale Lengths Fabricated on Lithium Niobate on Insulator Using Photolithography Assisted Chemo-Mechanical Etching显示文摘Optical true delay lines(OTDLs)of low propagation losses,small footprints and high tuning speeds and efficiencies are of critical importance for various photonic applications.Here,we report fabrication of electro-optically switchable OTDLs on lithium niobate on insulator using photolithography assisted chemo-mechanical etching.Our device consists of several low-loss optical waveguides of different lengths which are consecutively connected by electro-optical switches to generate different amounts of time delay.The fabricated OTLDs show an ultra-low propagation loss of^0.03dB/cm for waveguide lengths well above 100 cm. | 周俊霞 高仁宏 林锦添 汪旻 储蔚 李文博 尹狄峰 邓莉 方致伟 张健皓 伍荣波 程亚 | 2020 | Chinese Physics Letters2020，37，8： | 5 |
| 6 | Oxidation controlled lift-off of 3D chiral plasmonic Au nano-hooks显示文摘Colloidal suspensions of plasmonic nanoparticles (NPs) are a well-established tool for biomedical applications and enhanced spectroscopy because of their strong optical response.The specific response is greatly dependent on the NP shape.The strong optical activity of chiral NPs has created special interest but fabrication of chiral NPs in solution remains challenging.Here,we present an approach whereby three-dimensional (3D) chiral Au nano-hooks,fabricated with the parallel hole-mask colloidal lithography (HMCL) method,can be lifted off from a glass substrate in a controllable manner by using a combined treatment with oxygen plasma oxidation and a reduction step in solution.This method has the advantage of being based on established techniques and not requiring strong acids or complex substrates as in etching based approaches.We furthermore demonstrate the integration of the hook NPs into reversibly cross-linked hydrogels inspired by mussel catechol chemistry but containing an oxidation resistant catechol analogue grafted onto poly(allylamine) crosslinked by coordination of Al^3+ and how this facilitates the remote analysis of hydrogel microenvironment,e.g.the water content.The suspended particles are promising candidates for optically active surface-enhanced Raman spectroscopy (SERS),asymmetric photo catalysis or aggregation sensing.The integration into hydrogels to produce functional hydrogels holds benefits for applications of metamaterials in optics,sensing or activation in environmental remediation or drug delivery. | Gunnar Klos Amanda Andersen Matteo Miola Henrik Birkedal Duncan S. Sutherland | 2019 | Nano Research2019，12，7： | 4 |
| 7 | Hybrid multi-chip assembly of optical communication engines by in situ 3D nanolithography显示文摘Three-dimensional(3D)nano-printing of freeform optical waveguides,also referred to as photonic wire bonding,allows for efficient coupling between photonic chips and can greatly simplify optical system assembly.As a key advantage,the shape and the trajectory of photonic wire bonds can be adapted to the mode-field profiles and the positions of the chips,thereby offering an attractive alternative to conventional optical assembly techniques that rely on technically complex and costly high-precision alignment.However,while the fundamental advantages of the photonic wire bonding concept have been shown in proof-of-concept experiments,it has so far been unclear whether the technique can also be leveraged for practically relevant use cases with stringent reproducibility and reliability requirements.In this paper,we demonstrate optical communication engines that rely on photonic wire bonding for connecting arrays of silicon photonic modulators to InP lasers and single-mode fibres.In a first experiment,we show an eight-channel transmitter offering an aggregate line rate of 448 Gbit/s by low-complexity intensity modulation.A second experiment is dedicated to a four-channel coherent transmitter,operating at a net data rate of 732.7 Gbit/s-a record for coherent silicon photonic transmitters with co-packaged lasers.Using dedicated test chips,we further demonstrate automated mass production of photonic wire bonds with insertion losses of(0.7±0.15)dB,and we show their resilience in environmental-stability tests and at high optical power.These results might form the basis for simplified assembly of advanced photonic multi-chip systems that combine the distinct advantages of different integration platforms. | Matthias Blaicher Muhammad Rodlin Billah Juned Kemal Tobias Hoose Pablo Marin-Palomo Andreas Hofmann Yasar Kutuvantavida Clemens Kieninger Philipp-Immanuel Dietrich Matthias Lauermann Stefan Wolf Ute Troppenz Martin Moehrle Florian Merget Sebastian Skacel Jeremy Witzens Sebastian Randel Wolfgang Freude Christian Koos | 2020 | Light(Science & Applications)2020，9，1： | 4 |
| 8 | Ultra-broadband reflector using double-layer subwavelength gratings显示文摘Double-layer high-contrast subwavelength gratings that are separated by a dielectric space layer are investigated to achieve ultra-broadband reflection.The reflection phase of subwavelength gratings and the propagation phase shift between two gratings are manipulated to expand reflection bandwidth by properly stacking two reflective gratings.A reflector exhibiting a 99%reflectance bandwidth of^1080 nm in the near-infrared is designed.Then this reflector is prepared using laser interference lithography and ion beam planarization,and an ultra-broadband reflection is achieved with reflectance exceeding 97%over a wavelength range of 955 nm in the near-infrared region. | JINLONG ZHANG SHUAIKAI SHI HONGFEI JIAO XIAOCHUAN JI ZHANSHAN WANG XINBIN CHENG | 2020 | Photonics Research2020，8，3： | 4 |
| 9 | Continuous roll-to-roll patterning of three-dimensional periodic nanostructures显示文摘In this work,we introduce a roll-to-roll system that can continuously print three-dimensional(3D)periodic nanostructures over large areas.This approach is based on Langmuir-Blodgett assembly of colloidal nanospheres,which diffract normal incident light to create a complex intensity pattern for near-field nanolithography.The geometry of the 3D nanostructure is defined by the Talbot effect and can be precisely designed by tuning the ratio of the nanosphere diameter to the exposure wavelength.Using this system,we have demonstrated patterning of 3D photonic crystals with a 500 nm period on a 50×200 mm^(2) flexible substrate,with a system throughput of 3mm/s.The patterning yield is quantitatively analyzed by an automated electron beam inspection method,demonstrating long-term repeatability of an up to 88% yield over a 4-month period.The inspection method can also be employed to examine pattern uniformity,achieving an average yield of up to 78.6% over full substrate areas.The proposed patterning method is highly versatile and scalable as a nanomanufacturing platform and can find application in nanophotonics,nanoarchitected materials,and multifunctional nanostructures. | I-Te Chen Elizabeth Schappell Xiaolong Zhang Chih-Hao Chang | 2020 | Microsystems & Nanoengineering2020，6，1： | 4 |
| 10 | Directed self-assembly of block copolymers for sub-10 nm fabrication显示文摘Directed self-assembly(DSA)emerges as one of the most promising new patterning techniques for single digit miniaturization and next generation lithography.DSA achieves high-resolution patterning by molecular assembly that circumvents the diffraction limit of conventional photolithography.Recently,the International Roadmap for Devices and Systems listed DSA as one of the advanced lithography techniques for the fabrication of 3-5 nm technology node devices.DSA can be combined with other lithography techniques,such as extreme ultra violet(EUV)and 193 nm immersion(193i),to further enhance the patterning resolution and the device density.So far,DSA has demonstrated its superior ability for the fabrication of nanoscale devices,such as fin field effect transistor and bit pattern media,offering a variety of configurations for high-density integration and low-cost manufacturing.Over 1 T in-2 device density can be achieved either by direct templating or coupled with nanoimprinting to improve the throughput.The development of high x block copolymer further enhances the patterning resolution of DSA.In addition to its superiority in high-resolution patterning,the implementation ofDSA on a 300 mm pivot line fully demonstrates its potential for large-scale,high-throughput,and cost-effective manufacturing in industrial environment. | Yu Chen Shisheng Xiong | 2020 | International Journal of Extreme Manufacturing2020，2，3： | 4 |
| 11 | Self-organized phase-transition lithography for all-inorganic photonic textures显示文摘Realizing general processing applicable to various materials by one basic tool has long been considered a distant dream.Fortunately,ultrafast laser-matter interaction has emerged as a highly universal platform with unprecedented optical phenomena and provided implementation paths for advanced manufacturing with novel functionalities.Here,we report the establishment of a three-dimensional(3D)focal-area interference field actively induced by a single ultrafast laser in transparent dielectrics.Relying on this,we demonstrate a radically new approach of self-organized phase-transition lithography(SOPTL)to achieve super-resolution construction of embedded all-inorganic photonic textures with extremely high efficiency.The generated textures exhibit a tunable photonic bandgap(PBG)in a wide range from〜1.3 to〜2 pm.More complicated interlaced textures with adjustable structural features can be fabricated within a few seconds,which is not attainable with any other conventional techniques.Evidenee suggests that the SOPTL is extendable to more than one material system.This study augments light-matter interaction physics,offers a promising approach for constructing robust photonic devices,and opens up a new research direction in advaneed lithography. | Bo Zhang Dezhi Tan Zhuo Wang Xiaofeng Liu Beibei Xu Min Gu Limin Tong Jianrong Qiu | 2021 | Light(Science & Applications)2021，10，6： | 3 |
| 12 | Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging显示文摘High resolution Fresnel zone plates for nanoscale three-dimensional imaging of materials by both soft and hard x-rays are increasingly needed by the broad applications in nanoscience and nanotechnology.When the outmost zone-width is shrinking down to 50 nm or even below,patterning the zone plates with high aspect ratio by electron beam lithography still remains a challenge because of the proximity effect.The uneven charge distribution in the exposed resist is still frequently observed even after standard proximity effect correction(PEC),because of the large variety in the line width.This work develops a new strategy,nicknamed as local proximity effect correction(LPEC),efficiently modifying the deposited energy over the whole zone plate on the top of proximity effect correction.By this way,50 nm zone plates with the aspect ratio from 4:1 up to 15:1 and the duty cycle close to 0.5 have been fabricated.Their imaging capability in soft(1.3 keV)and hard(9 keV)x-ray,respectively,has been demonstrated in Shanghai Synchrotron Radiation Facility(SSRF)with the resolution of 50 nm.The local proximity effect correction developed in this work should also be generally significant for the generation of zone plates with high resolutions beyond 50 nm. | 朱静远 张思超 谢珊珊 徐晨 张丽娟 陶旭磊 任玉琦 王玉丹 邓彪 邰仁忠 陈宜方 | 2020 | Chinese Physics B2020，29，4： | 3 |
| 13 | Plasmonic metalens for nanofabrication显示文摘INTRODUCTION Optical lithography is the primary tool for the fabrication of micro/nanostructures in micro-electronic and opto-electronic applications,which has fueled the explosive growth of the semiconductor industry.Over the past several decades,the resolution of optical lithography | Xiangang Luo | 2018 | National Science Review2018，5，2： | 3 |
| 14 | Macroscopic Ag nanostructure array patterns with high-density hotspots for reliable and ultra-sensitive SERS substrates显示文摘Syn thesis of metal nano structures arrays with large amounts of small nano-gaps on a homoge nous macroscale is of significant in terest and importa nee in chemistry,biotech no logy,physics,and nan otech no logy because of their enhan ced properties.However,the fabricatio n of uncovered nano-gaps with high-density and uniformity is rather difficult due to the complex and multiple synthetic steps.In this research,a facile and low-cost approach is demonstraind for the synthesis of high-density small nano-gaps(about 3.4 nm)between silver nanostructure array patter ns(SNAPs)over a large area.Uniform nan o?hole patter ns were periodically gen erated over an entire substrate using nano-impri nt lithography.Electrochemical reacti on at the high over-potential produced multiple silver nano crystals inside the nano-hole patter ns,gen erati ng a high-de nsity of small and un covered nano-gaps.Finally,we fully dem on strate their applicati on in the rapid detectio n of rhodamine 6G(R6G)molecules by surface-enhaneed Raman scattering(SERS)spectroscopy with a very low detection limit(1 fM)as well as excellent signal uniformity(RSD<8.0%±2.5%),i ndicati ng an extra ordinary capability for single-molecule detecti on. | Taeksu Lee Soongeun Kwon San ghee Jung Hyungjun Lim Jae-Jong Lee | 2019 | Nano Research2019，12，10： | 3 |
| 15 | Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure显示文摘Functional nanostructures are exploited for a variety of cutting-edge fields including plasmonics,metasurfaces,and biosensors,just to name a few.Some applications require nanostructures with uniform feature sizes while others rely on spatially varying morphologies.However,fine manipulation of the feature size over a large area remains a substantial challenge because mainstream approaches to precise nanopatterning are based on low-throughput pixel-by-pixel processing,such as those utilizing focused beams of photons,electrons,or ions.In this work,we provide a solution toward wafer-scale,arbitrary modulation of feature size distribution by introducing a lithographic portfolio combining interference lithography(IL)and grayscale-patterned secondary exposure(SE).Employed after the high-throughput IL,a SE with patterned intensity distribution spatially modulates the dimensions of photoresist nanostructures.Based on this approach,we successfully fabricated 4-inch wafer-scale nanogratings with uniform linewidths of<5%variation,using grayscale-patterned SE to compensate for the linewidth difference caused by the Gaussian distribution of the laser beams in the IL.Besides,we also demonstrated a wafer-scale structural color painting by spatially modulating the filling ratio to achieve gradient grayscale color using SE. | Zhuofei Gan Hongtao Feng Liyang Chen Siyi Min Chuwei Liang Menghong Xu Zijie Jiang Zhao Sun Chuying Sun Dehu Cui Wen-Di Li | 2022 | Light(Science & Applications)2022，11，5： | 3 |
| 16 | Broadband mid-IR antireflective Reuleaux-triangle-shaped hole array on germanium显示文摘A gradient-index Reuleaux-triangle-shaped hole array was fabricated on germanium(Ge)by nanoimprint lithography and inductively coupled plasma processing as a broadband mid-infrared(IR)antireflective surface.The interaction between the{111}planes of cubic crystalline Ge and a circular mold successfully produced an orderly and periodically distributed Reuleaux-triangle-shaped hole array.As a result,the average transmittance increased 15.67% over the waveband at 3–12μm and remained stable at the incidence angle of up to 60°.The vertices of the Reuleaux triangle showed local enhancement of the electric field intensities due to interference of the incident and reflected radiation fields.It was also found that nonuniform hole depths acted to modulate the transmittance over the 3–12μm waveband. | 程海娟 东苗 谭钦文 孟令海 蔡毅 姜杰 杨伟声 钟海政 王岭雪 | 2019 | Chinese Optics Letters2019，17，12： | 3 |
| 17 | Structural color switching with a doped indium-gallium-zinc-oxide semiconductor显示文摘Structural coloration techniques have improved display science due to their high durability in terms of resistance to bleaching and abrasion,and low energy consumption.Here,we propose and demonstrate an all-solid-state,large-area,lithography-free color filter that can switch structural color based on a doped semiconductor.Particularly,an indium-gallium-zinc-oxide(IGZO)thin film is used as a passive index-changing layer.The refractive index of the IGZO layer is tuned by controlling the charge carrier concentration;a hydrogen plasma treatment is used to control the conductivity of the IGZO layer.In this paper,we verify the color modulation using finite difference time domain simulations and experiments.The IGZO-based color filter technology proposed in this study will pave the way for charge-controlled tunable color filters displaying a wide gamut of colors on demand. | INKI KIM JUYOUNG YUN TREVON BADLOE HYUK PARK TAEWON SEO YOUNGHWAN YANG JUHOON KIM YOONYOUNG CHUNG AND JUNSUK RHO | 2020 | Photonics Research2020，8，9： | 3 |
| 18 | Pyrolysis-induced shrinking of threedimensional structures fabricated by twophoton polymerization:experiment and theoretical model显示文摘The introduction of two-photon polymerization(TPP)into the area of Carbon Micro Electromechanical Systems(CMEMS)has enabled the fabrication of three-dimensional glassy carbon nanostructures with geometries previously unattainable through conventional UV lithography.Pyrolysis of TPP structures conveys a characteristic reduction of feature size—one that should be properly estimated in order to produce carbon microdevices with accuracy.In this work,we studied the volumetric shrinkage of TPP-derived microwires upon pyrolysis at 900℃.Through this process,photoresist microwires thermally decompose and shrink by as much as 75%,resulting in glassy carbon nanowires with linewidths between 300 and 550 nm.Even after the thermal decomposition induced by the pyrolysis step,the linewidth of the carbon nanowires was found to be dependent on the TPP exposure parameters.We have also found that the thermal stress induced during the pyrolysis step not only results in axial elongation of the nanowires,but also in buckling in the case of slender carbon nanowires(for aspect ratios greater than 30).Furthermore,we show that the calculated residual mass fraction that remains after pyrolysis depends on the characteristic dimensions of the photoresist microwires,a trend that is consistent with several works found in the literature.This phenomenon is explained through a semi-empirical model that estimates the feature size of the carbon structures,serving as a simple guideline for shrinkage evaluation in other designs. | Braulio Cardenas-Benitez Carsten Eschenbaum Dario Mager Jan G.Korvink Marc JMadou Uli Lemmer Israel De Leon Sergio O.Martinez-Chapa | 2019 | Microsystems & Nanoengineering2019，5，1： | 2 |
| 19 | AgGeSbTe thin film as a negative heat-mode resist for dry lithography显示文摘An AgGeSbTe thin film is proposed as a negative heat-mode resist for dry lithography.It possesses high etching selectivity with the etching rate difference of as high as 62 nm/min in CHF_(3)/O_(2)mixed gases.The etched sidewall is steep without the obvious lateral corrosion.The lithographic characteristics and underlying physical mechanisms are analyzed.Besides,results of X-ray diffraction,Raman spectroscopy,and X-ray photoelectron spectroscopy further indicate that laser irradiation causes the formation of Ge,Sb,and AgTe crystals,which is the basis of etching selectivity.In addition,the etching selectivity of Si to AgGeS_(b)Te resist is as high as 19 at SF_(6)/Ar mixed gases,possessing good etching resistance.It is believed that the AgGeSbTe thin film is a promising heat-mode resist for dry lithography. | 陈兴旺 陈雷 王莹 魏涛 胡敬 程淼 刘倩倩 李宛飞 凌云 刘波 | 2022 | Chinese Optics Letters2022，20，3： | 2 |
| 20 | Development of an Experimental EUVL System显示文摘The authors have developed an experimental system for the studies of extreme ultraviolet projection lithography at 13.0nm wavelength, which includes a laser plasma source, an ellipsoidal condenser, a transmission mask and a Schwarzschild optics. The optical system is optimized to achieve 0.1μm resolution over a 0.1mm diameter image field of view and the mirrors of the objective were coated with Mo/Si multilayer to provide 60% reflectance at near normal incidence angle for 13.0nm radiation. | JIN Chun shui, MA Yue ying, PEI Shu,CAO Jian lin (Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130022, China) | 2001 | 光学精密工程2001，9，5： | 2 |
您所在的机构暂未开通此部分的功能，请联系管理员